NAVIGATOR / TWISTORR TURBOMOLECULAR PUMP

Agilent developed two innovative molecular drag stages technological platforms: TwisTorr and MacroTorr. Turbomolecular pumps are widely used in High Energy Physics, Fusion Technology and general UHV research. Synchrotron light Sources, Particle Accelerator Rings, UHV laboratory research, and Fusion reactors need extremely clean, reliable and cost effective HV and UHV.F  Maintenance-free pumps are specifically required, because most pumps are not easily accessible.

FEATURES AND BENEFITS

  • Agilent turbomolecular pumps are designed to offer unmatched reliability, performance and cleanliness for these applications. Ceramic bearing pumps, thanks to their reduced rolling friction, low stress and high thermal stability compared to conventional bearings, deliver longer operating life. Ultra low vapor pressure solid lubricant eliminates the need for maintenance and assures clean operation under any operating conditions.
  • Furthermore, in contrast to most of the other pumps, all Agilent turbopumps have both the upper and the lower bearing in the rough vacuum side and not exposed to UHV, further reducing the possibility of contamination – even in case of misuse.
  • The patented TwisTorr stages provide the highest speed and      compression ratio in the smallest footprint; furthermore all Agilent turbopumps can truly be mounted in any orientation, from vertical to horizontal to upside down, aiding system design in the most stringent space requirements.
  • Agilent turbopumps can operate at higher foreline pressures, allowing the use of dry roughing pumps, thus providing a completely clean, oil-free compact and cost effective pumping package.
  • Whenever a large amount of gas has to be pumped and higher throughput is needed, the combination of TwisTorr pumps and TriScroll dry pumps is the state-of-the-art solution.

All Agilent turbopumps have integrated or on board controller versions allowing easy plug and pump operation, or a rack-mounted controller for applications where the electronics need to be remotely placed (i.e. radioactive environments).

turbo-v-850_twistorr_rack


PERFORMANCE:

    Turbo-V81T Turbo-V81M TwisTorr-84FS TwisTorr-304FS Turbo-V551 Navigator Turbo-V701 Navigator Turbo-V750 TwisTorr Turbo-V850
TwisTorr		 Turbo-V1001 Navigator Turbo-V2300 TwisTorr Turbo-V1K-G Turbo-V2K-G System Turbo-V3K-G System
    DN40 DN63 DN40 DN63 DN40 DN63 DN100 DN160 DN100 DN160 DN200 DN100 DN160 DN200 DN160 DN200 DN250 DN250 DN160 DN200 DN250 DN250
Pumping speed, l/s Nitrogen 50 77 50 77 56 67 250 250 350 550 690 370 700 750 790 950 1050 2050 810 1080 1600 2200
Helium 56 65 56 65 46 63 255 255 450 600 620 500 680 690 820 870 900 1800 950 1150
Hydrogen 46 50 46 50 40 53 220 220 450 510 510 470 580 590 860 900 920 1500 680 730
Argon 57 66 250 250 340 680 700 750 1040
Compression ratio Nitrogen 7×108 3×108 >1×1011 >1×1011 >1×109 1×109 1×1011 1×1011 1×109 >8×108 >5×107 3×105 >1×107
Helium 3×103 8×104 2.0×106 >1×108 1×107 1×107 2×108 2×108 1×107 8×105 >4×104
Hydrogen 3×102 7×103 5.0×104 1.5×106 1×106 1×106 2.5×106 2.5×106 1×106 4×104 1.5×104
Argon >1×1011 >1×1011 1×1011 1×1011 5×108
Base pressure, mbar   5×10-9 5×10-10 <8×10-10 <1×10-10 <1×10-10 <1×10-10 <1×10-10 <1×10-10 <1×10-10 <1×10-10 <1×10-10 <1×10–8 <1×10–9
Startup time, min   < 1 < 1 <2 < 3 <5 <5 <6 <3 <4 <6 <5 <7 <6
Rotational speed, rpm   80,000 80,000 81,000 60,000 42,000 42,000 50,000 50,000 38,000 33,300 45,660 33,000 31,800
Inlet flange,  nominal diameter KF, mm 40 40 40
CF, mm 35 63 35 63 35 63 100 160 100 160 200 100 160 200 200 250
ISO, mm 63 63 63 100 160 160 200 160 200 160 200 250
ISO-F, mm 160-F 200-F 160 200 200-F 250-F 250-F 160-F 200-F 250-F 250-F
Foreline flange, nominal diameter KF NW16 NW16 NW16 NW16 (NW25 optional) NW25 NW25 NW25 NW25
NW40		 NW40 NW40 NW25 NW40 NW40 NW40
SEM version   V V V V
Controllers Rack V V V V V V V V V V V
on board V V V V V V V V
Integrated electronics V V V V
PCB V V V


Turbo-V 2K-G Turbomolecular Pump

turbo-v-2k-g-system turbo-v-3k-g_1

The Turbo-V 2K.G is more than a pump – it is a dedicated pumping system, designed for the Plasma process industry. In fact, Its pumping stages and entire pump structure are optimized to work with very high Ar gas flows and temperatures. The additional features of on board electronics, integrated vent and purge valve and maintenance free bearings set make the Turbo-V 2K-G the optimum solution for the coating industry

FEATURES AND BENEFITS

  • The first application-specific pumping solution designed for thin film deposition equipment
  • The highest performing, most compact unit available
  • The first fully integrated approach for maximum system productivity and uptime
  • Integrated package includes Turbo Molecular Pump, Drive Electronics, Power Supply, Monitor, Purge Gas and Communication
  • Versatile electronics interface with easy to use control Software
  • Analog I/O signals and RS232 / RS485 interface as standard
  • Varian Profibus® interface as option

Navigator Turbomolecular Pump

turbo-v-551 turbo-v-551-iso160-navig-controll-pkg_02 turbo-v-850_twistorr_rack turbo-v-1001-cf10_02 turbo-v-1001-iso-250-f_01 turbo-v-1001-iso-250-f_02

TwisTorr Turbomolecular Pump

twistorr-84-fs twistorr-304-cf6-ac_oem_02 twistorr-304-fs_730x730a twistorr-304-iso100_basic_01 twistorr-304-iso100_basic_02